工艺领先丨曼恩斯特真空镀膜设备矩阵发布
导语
真空镀膜技术是泛半导体制造的核心工艺，直接影响光伏电池、显示屏、新能源器件等产品的性能和量产效率。随着全球对钙钛矿光伏、柔性显示等高端技术的需求激增，市场对镀膜设备的精度、稳定性和多材料兼容性提出了更高要求。
在泛半导体领域精密涂布技术持续突破的浪潮中，曼恩斯特正式推出三大真空镀膜设备——单体磁控真空镀膜设备、磁控溅射连续线真空镀膜设备及卧式点源蒸镀设备，以差异化技术矩阵精准覆盖新能源、光伏、显示等核心产业需求，加速国产高端镀膜装备自主化进程。
单体磁控真空镀膜设备
单体磁控真空镀膜设备适用于硬质涂层、氢能源双极板、装饰等领域，可实现硬质膜、介质膜、导电膜的沉积。设备配置公自转转架，实现产品全方位镀膜。根据产品镀膜功能性选择需求，通过配置不同靶材，实现反应溅射或者单质溅射，达到最终的产品性能要求。
产品参数
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产品特点
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紧凑型设计
高度集成化设备外观
转架转速可调节
多元镀层沉积技术
公自转转架
转速可设定
可实现单一镀层沉积
多种镀层复合沉积
磁控溅射连续线真空镀膜设备
磁控溅射连续线真空镀膜设备适用于光伏、触控显示、光学、装饰、电磁屏蔽等领域，可实现介质膜、导电膜的沉积。针对钙钛矿光伏领域，设备配置低损伤阴极，可有效保护钙钛矿功能涂层，降低高能电子损伤。针对其他应用领域，通过配置不同的靶位材料，按照工艺顺序，依次布局靶位，可实现最终的产品效果。
产品参数
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产品特点
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模块化腔体设计
定制单/双面镀膜靶位
连续性产品输出
定制化生产节拍
低电子损伤
镀层靶位设计
可据客户定试验
中试、量产机型
卧式点源蒸镀设备
卧式点源蒸镀设备适用于光伏、OLED、QLED等领域，可实现有机材料、金属或者无机材料的沉积。设备配置分布式点源，根据材料物理特性，选择性的配置金属或者陶瓷点源，根据产品的幅宽，配置不同的点源数量。膜层沉积配置高精度晶控系统，可精确控制镀层厚度。在镀层均匀性上，采用PID与晶控联动的模式，控制点源蒸发温度以及材料蒸发速率。
产品参数
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产品特点
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模块化腔体设计
高精度蒸发源结构
定制化机型选择
定制化生产节拍
此次三大设备的发布，不仅填补了国产高端真空镀膜装备在精度控制与工艺适配性上的空白，亦为泛半导体产业核心技术突破注入了新动能。未来，曼恩斯特将持续深化精密涂布技术与真空镀膜工艺的融合创新，携手产业链上下游开拓更多元化的应用场景，一同助力行业高质量发展。
Vacuum coating technology is the core process of pan-semiconductor manufacturing, which directly affects the performance and mass production efficiency of products such as photovoltaic cells, displays and new energy devices. With the surge in global demand for high-end technologies such as chalcogenide photovoltaics and flexible displays, the market has put forward higher requirements for the precision, stability and multi-material compatibility of coating equipment.
In the wave of continuous breakthroughs in precision coating technology in the pan-semiconductor field, Manst formally launched three major vacuum coating equipments - monolithic magnetron vacuum coating equipments, magnetron sputtering continuous line vacuum coating equipments and horizontal point source evaporation equipments - to accurately cover the needs of new energy, photovoltaics, displays and other core industries with the differentiated technology matrix and accelerate the independent process of domestic high-end coating equipments. Domestic high-end coating equipment independent process.
The single magnetron vacuum coating equipment is suitable for hard coating, hydrogen energy bipolar plate, decoration and other fields, which can realize the deposition of hard film, dielectric film and conductive film. The equipment is equipped with male and female rotating racks to realize all-round coating of products. According to the product coating functionality selection needs, through the configuration of different targets, to realize the reaction sputtering or monolithic sputtering, to achieve the final product performance requirements.
The magnetron sputtering continuous line vacuum coating equipment is suitable for photovoltaic, touch display, optical, decorative, electromagnetic shielding and other fields, can realize the deposition of dielectric film, conductive film. For the field of chalcogenide photovoltaic, the equipment is equipped with low-damage cathode, which can effectively protect the chalcogenide functional coating and reduce the high-energy electron damage. For other application fields, through the configuration of different target materials, according to the process order, the sequential layout of the target, can realize the final product effect.
The horizontal point source vapor deposition equipment is suitable for photovoltaic, OLED, QLED and other fields, and can realize the deposition of organic materials, metal or inorganic materials. The equipment is equipped with distributed point sources, selectively configuring metal or ceramic point sources according to the physical properties of the material, and configuring different numbers of point sources according to the width of the product. The film deposition is equipped with a high-precision crystal control system, which can accurately control the thickness of the coating layer. In terms of coating uniformity, the PID and crystal control linkage mode is adopted to control the evaporation temperature of the point source and the evaporation rate of the material.
The release of the three major equipment not only fills the blank of domestic high-end vacuum coating equipment in precision control and process adaptability, but also injects new kinetic energy for the core technology breakthrough in the pan-semiconductor industry. In the future, Manst will continue to deepen the integration and innovation of precision coating technology and vacuum coating process, and work together with the upstream and downstream of the industry chain to develop more diversified application scenarios, and help the industry develop in a high quality manner.
校对丨小江
文案丨十二
美编丨十二
审核丨魏小姐
（转自：曼恩斯特）